TOPIC 4:
Plasma surface interaction (boundary layers, sheath, surface
processes)
P1.42 Andrew Das Arulsamy, Kristina Eleršič, Uroš Cvelbar, Miran Mozetič
OXYGEN-VACANCY SUPERLATTICES IN a-Fe2O3 NANOSTRUCTURE DUE TO PLASMA OXIDATION
P1.43 G. Arnoult, T. Belmonte, G. Henrion
| Deposition of nanostructures by chemical vapour deposition enhanced with an atmospheric pressure remote Ar-O2 plasma.
P1.44 M. S. Benilov, L. G. Benilova
| SPACE-CHARGE SHEATHS IN DISCHARGES BURNING IN CATHODE VAPOR
P1.45 Lucia Bónová, Anna Zahoranová, Miroslav Zahoran, Mirko Černák
| INFLUENCE OF ATMOSPHERIC-PRESSURE PLASMA TREATMENT OF ALUMINIUM SURFACE ON THE DIFFERENT ORGANOSILANE COATINGS
P1.46 Kristian Dittmann, Timo Gans, Bert Krames, Jürgen Meichsner
| ANALYSIS OF FAST NEUTRAL OXYGEN ATOMS IN CAPACITIVELY COUPLED RF PLASMA
P1.47 Olivier Guaitella, Ilya Marinov, Antoine Rousseau
| Influence of adsorbed charges on self-synchronization of streamers breakdown
P1.48 Binjie Dong, Olivier Guaitella, Antoine Rousseau
| SURFACE DISTRIBUTION OF ELECTRIC CHARGE IN A SURFACE DBD
P1.49 Vasco Guerra, Olivier Guaitella, Daniil Marinov, Carlos D. Pintassilgo, Marko Hubner, Jurgen Ropcke, Antoine Rousseau
| A SIMPLE MODEL OF THE SURFACE OXIDATION OF NO IN NO2
P1.50 Julien Annaloro, Damien Studer, Pascal Boubert, Pierre Vervisch
| BOUNDARY LAYER ANALYSIS IN AIR PLASMA BY LASER DIAGNOSTICS AND SPECTROSCOPY
P1.51 Anna V. Khlyustova, Alexander I. Maximov, Mikhail S. Khorev, Nikolai A. Sirotkin
| The processes on the plasma-liquid interface. The non-equilibrium evaporation and radiation of glow discharge
P1.52 Anatoly Kuzmichev, Igor Belousov, Vladimir Biber
| ION SPUTTERING OF TARGETS CONTACTING WITH IONIZED METAL VAPOR FLOW FOR COMPOSITE COATING DEPOSITION
P1.53 Ana Borrás, Pablo Romero-Gómez, Manuel Macías, Juan Ramón Sánchez-Valencia, Rafael Álvarez, José Cotrino, Agustín R. González-Elipe
| Plasma Sheath Effects for the Formation of Supported 1D Nanostructures by Plasma Deposition
P1.54 D. Marinov, M. Hübner, O. Guaitella, J. Röpcke, A. Rousseau
| Production/conversion of molecules on catalytic surfaces under plasma exposure
P1.55 BRANISLAV RADJENOVIC, MARIJA RADMILOVIC-RADJENOVIC
| THE INFLUENCE OF THE TEMPERATURE ON THE ETCHING RATE OF SILICON FOR DEVICE FABRICATION IN NANOTECHNOLOGIES
P1.56 BRANISLAV RADJENOVIC, MARIJA RADMILOVIC-RADJENOVIC
| SMOOTHING OF THE ROUGH SURFACE IN NANOTECHNOLOGIES
P1.57 Bransilav Radjenovic, Marija Radmilovic-Radjenovic
| THREE-DIMENSIONAL LEVEL SET ETCHING PROFILE EVOLUTION SIMULATIONS
P1.58 Vasilka Steflekova, Djordje Spasojević, Nikola M. Šišović, Nikola Konjević
| STUDY OF CATHODE SHEATH IN HYDROGEN GLOW DISCHARGE
P1.60 Stefan Tinck, Annemie Bogaerts, Werner Boullart
| Modeling Ar/Cl2/O2 and Ar/SiH4/O2 Inductively Coupled Plasmas used for anisotropic etching of silicon and deposition of SiOx
P1.61 Branko Tomcik, Thomas Osipowicz
| Nanolaminated advanced carbon overcoat study by Rutherford backscattering spectroscopy and Monte Carlo ion beam simulation of film growth
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